Influence of laser fluence in ArF-excimer laser assisted crystallisation of a-SiGe:H films

Applied Surface Science

Volumn 208-209, Issue 1, 2003, Pages 358-363

  Chiussi, S ^a   Lopez E ^a   Serra, J ^a   Gonzalez P ^a   Serra, C ^a   Leon B ^a   Fabbri, F ^b   Fornarini, L ^b   Martelli, S ^b,c  

^a UNIVERSITY OF VIGO   (Spain)

^b ENEA   (Italy)

^c CENTRO SVILUPPO MATERIALI S P A   (Italy)

Author keywords

A SiGe:H; ArF excimer laser; Excimer laser crystallisation; Laser CVD; Poly SiGe

Indexed keywords

AMORPHOUS FILMS; CRYSTALLIZATION; EXCIMER LASERS; GRAIN SIZE AND SHAPE; POLYCRYSTALLINE MATERIALS; SILICON COMPOUNDS; BOLOMETERS; CHEMICAL VAPOR DEPOSITION; COMPOSITION EFFECTS; HYDROGENATION; IRRADIATION; LASER PULSES; MICROELECTRONICS; SILICON ALLOYS; SILICON SOLAR CELLS; STRUCTURE (COMPOSITION); SURFACES; THIN FILM TRANSISTORS;

LASER FLUENCE; MICROBOLOMETERS;

THIN FILMS; POLYCRYSTALLINE MATERIALS;

EID: 0037443225     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0169-4332(02)01399-5     Document Type: Conference Paper

References (15)

1. Sedky S., Fiorini P., Caymax M., Verbist A., Baert C. Sens. Actuators. A66:1998;193.
2. Sedky S., Fiorini P., Caymax M., Baert C., Hermans L., Mertens R. IEEE Elect. Device Lett. 19:1998;376.
3. Yamauchi N., Reif R. J. Appl. Phys. 75:1994;3235.
4. Tsunoda I., Nagata T., Kenjo A., Sadoh T., Miyao M. Mater. Sci. Eng. B89:2002;336.
5. Herman I.P. Chem. Rev. 89:1989;1323.
6. Chiussi S., González P., Serra J., León B., Pérez-Amor M. Appl. Surf. Sci. 106:1996;75.
7. E. López, S. Chiussi, J. Serra, P. González, C. Serra, B. León, M. Pérez-Amor, Appl. Surf. Science, in press.
8. Chiussi S., Serra C., Serra J., González P., León B., Urban S., Andrä G., Bergmann J., Falk F., Fabbri F., Fornarini L., Martelli S., Rinaldi F. Appl. Surf. Sci. 186:2002;166.
9. Gupta V.V., Song H.J., Im J.S. Appl. Phys. Lett. 71:1997;99.
10. Campisano S.U., Jacobson D.C., Poate J.M., Cullis A.G., Chew N.G. Appl. Phys. Lett. 46:1985;846.
11. Frangis N., VanLanduyt J., Larciprete R., Martelli S., Borsella E., Chiussi S., Castro J., León B. Appl. Phys. Lett. 72:1998;2877.
12. Lengsfeld P., Nickel N.H., Fuhs W. Appl. Phys. Lett. 76:2000;1680.
13. Suzuki K., Takahashi M., Saitoh M. Appl. Phys. A69:1999;S263.
14. Mei P., Boyce J.B., Hack M., Lujan R.A., Johnson R.I., Anderson G.B., Fork D.K., Ready S.E. Appl. Phys. Lett. 64:1994;1132.
15. Yu Q., Clancy P. J. Cryst. Growth. 149:1995;45.