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Volumn 208-209, Issue 1, 2003, Pages 682-687
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ArF-excimer laser induced chemical vapour deposition of amorphous hydrogenated SiGeC films
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Author keywords
Band gap engineering; Excimer laser; Laser induced CVD; SiGeC
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Indexed keywords
BANDWIDTH;
CHEMICAL VAPOR DEPOSITION;
COMPOSITION EFFECTS;
EXCIMER LASERS;
FILM GROWTH;
HYDROGENATION;
OPTOELECTRONIC DEVICES;
SILICON COMPOUNDS;
STOICHIOMETRY;
SUBSTRATES;
FOURIER TRANSFORM INFRARED SPECTROSCOPY;
GLASS;
MULTILAYERS;
SEMICONDUCTING SILICON COMPOUNDS;
X RAY PHOTOELECTRON SPECTROSCOPY;
BAND GAP ENGINEERING;
SOLID PHASE EPITAXY;
SEMICONDUCTING FILMS;
THIN FILMS;
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EID: 0037443272
PISSN: 01694332
EISSN: None
Source Type: Journal
DOI: 10.1016/S0169-4332(02)01426-5 Document Type: Conference Paper |
Times cited : (11)
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References (15)
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