메뉴 건너뛰기




Volumn 208-209, Issue 1, 2003, Pages 682-687

ArF-excimer laser induced chemical vapour deposition of amorphous hydrogenated SiGeC films

Author keywords

Band gap engineering; Excimer laser; Laser induced CVD; SiGeC

Indexed keywords

BANDWIDTH; CHEMICAL VAPOR DEPOSITION; COMPOSITION EFFECTS; EXCIMER LASERS; FILM GROWTH; HYDROGENATION; OPTOELECTRONIC DEVICES; SILICON COMPOUNDS; STOICHIOMETRY; SUBSTRATES; FOURIER TRANSFORM INFRARED SPECTROSCOPY; GLASS; MULTILAYERS; SEMICONDUCTING SILICON COMPOUNDS; X RAY PHOTOELECTRON SPECTROSCOPY;

EID: 0037443272     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0169-4332(02)01426-5     Document Type: Conference Paper
Times cited : (11)

References (15)


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.