Proposal for the coma aberration dependent overlay error compensation technology

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 37, Issue 12 B, 1998, Pages 6718-6722

  Asai, Naoko ^a   Hasegawa, Norio ^a   Gotoh, Yasuko ^a   Satoh, Hidetoshi ^a   Hayano, Katsuya ^a   Imai, Akira ^a   Okazaki, Shinji ^a  

^a HITACHI LTD   (Japan)

Author keywords

Absolute correction; Coma aberrations; Lens distortion correction method; Overlay error; Pattern placement error corrected mask; Relative correction

Indexed keywords

EID: 19644389377     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/jjap.37.6718     Document Type: Article

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