Pattern deformation induced from intensity-unbalanced off-axis illumination

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 3051, Issue , 1997, Pages 54-65

  Kim, Jin Ha ^a   Oh, Seok Hwan ^a   Lee, Dong Seon ^a   Yeo, Jeong Ho ^a   Yu, Yong H ^a   Nam, Jeong Lim ^a  

^a SAMSUNG Electronics   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

COMPUTER SIMULATION; DEFORMATION; DISTANCE MEASUREMENT; IMAGE QUALITY; OPTICAL SYSTEMS; RANDOM ACCESS STORAGE; SEMICONDUCTOR DEVICE MANUFACTURE;

CRITICAL DIMENSIONS; DRAM; OPTICAL MICROLITHOGRAPHY; RESOLUTION ENHANCEMENT;

PHOTOLITHOGRAPHY;

EID: 0031357580     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.275980     Document Type: Conference Paper

References (6)