Towards the morphology control of stain etched porous silicon

Journal of Porous Materials

Volumn 7, Issue 1, 2000, Pages 405-408

  Schirone, L ^a,c   Sotgiu, G ^a   Montecchi, M ^b  

^a ROMA TRE UNIVERSITY   (Italy)

^b ENEA C R CASACCIA   (Italy)

^c SAPIENZA UNIVERSITY OF ROME   (Italy)

Author keywords

[No Author keywords available]

Indexed keywords

APPROXIMATION THEORY; DIELECTRIC PROPERTIES OF SOLIDS; ETCHING; FINITE DIFFERENCE METHOD; HIGH RESOLUTION ELECTRON MICROSCOPY; LIGHT REFLECTION; MATHEMATICAL MODELS; MORPHOLOGY; OXIDATION; POROSITY; SEMICONDUCTING FILMS; SEMICONDUCTING SILICON;

EFFECTIVE MEDIUM APPROXIMATION; REFLECTANCE SPECTROMETRY; STAIN ETCHING;

POROUS SILICON;

EID: 0033879138     PISSN: 13802224     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Article

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