A novel isolation of pillarlike structures by CMP and etchback processes

Electrochemical and Solid-State Letters

Volumn 8, Issue 5, 2005, Pages

  Suligoj, Tomislav ^a   Wang, Kang L ^b  

^a UNIVERSITY OF ZAGREB   (Croatia)

^b UNIVERSITY OF CALIFORNIA   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

BIPOLAR TRANSISTORS; CHEMICAL MECHANICAL POLISHING; CHEMICAL VAPOR DEPOSITION; CMOS INTEGRATED CIRCUITS; ETCHING; MICROPROCESSOR CHIPS; MOS DEVICES;

CHEMICAL MECHANICAL PLANARIZATION (CMP); ETCHBACK PROCESSES; PILLARS; SLURRY;

SILICON;

EID: 18944386474     PISSN: 10990062     EISSN: None     Source Type: Journal    
DOI: 10.1149/1.1883979     Document Type: Article

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