New dummy-free shallow trench isolation concept for mixed-signal applications

Journal of the Electrochemical Society

Volumn 147, Issue 10, 2000, Pages 3827-3832

  Badenes, G ^a   Rooyackers, R ^a   Augendre, E ^a   Vandamme, E ^a   Perello C ^a   Heylen, N ^a   Grillaert, J ^a   Deferm, L ^a  

^a IMEC   (Belgium)

Author keywords

[No Author keywords available]

Indexed keywords

DUMMY ACTIVE AREAS; LOW PRESSURE CHEMICAL VAPOR DEPOSITION; MIXED SIGNAL TECHNOLOGIES; NITRIDE EROSION; OXIDE DISHING; SHALLOW TRENCH ISOLATION;

CHEMICAL MECHANICAL POLISHING; CHEMICAL VAPOR DEPOSITION; EROSION; ETCHING; MASKS; NITRIDES; OXIDATION; OXIDES; PHOSPHORIC ACID; PHOTOLITHOGRAPHY; PLASMAS; SILICON;

INTEGRATED CIRCUIT MANUFACTURE;

EID: 0034294432     PISSN: 00134651     EISSN: None     Source Type: Journal    
DOI: 10.1149/1.1393980     Document Type: Article

References (10)

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