Effect of water adsorption on Ti film initial growth on SiO2 surface

Surface Science

Volumn 433, Issue , 1999, Pages 496-500

  Ohwaki, T ^a   Aoki, K ^a   Yoshida, T ^a   Hashimoto, S ^a   Mitsushima, Y ^a   Taga, Y ^a  

^a Rd Management Section   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ADSORPTION; AUGER ELECTRON SPECTROSCOPY; COMPOSITION EFFECTS; DEPOSITION; FILM GROWTH; OXIDATION; REDUCTION; SURFACES; THIN FILMS; TITANIUM; WATER;

METAL INSULATOR INTERFACES; STRANSKI-KRASTANOV GROWTH MODE;

SILICA;

EID: 0033337038     PISSN: 00396028     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0039-6028(99)00470-7     Document Type: Article

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