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Volumn 338, Issue , 2000, Pages

Ozone treatment of SiC for improved performance of gas sensitive Schottky diodes

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL CLEANING; CHEMICAL SENSORS; ELLIPSOMETRY; HYDROGEN; OXIDATION; OZONE; SCHOTTKY BARRIER DIODES; SEMICONDUCTING SILICON COMPOUNDS; SILICA; SPECTROSCOPY; SURFACE CLEANING;

EID: 18844463006     PISSN: 02555476     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Article
Times cited : (8)

References (11)
  • 7
    • 0342930506 scopus 로고    scopus 로고
    • UVO cleaner, model 42-220, Novakemi AB, Box 6021, SE-122 06 Enskede, Sweden
    • UVO cleaner, model 42-220, Novakemi AB, Box 6021, SE-122 06 Enskede, Sweden.


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.