Formation and oxidation of Si nanoclusters in Er-doped Si-rich SiO x

Journal of Applied Physics

Volumn 97, Issue 9, 2005, Pages

  Pi, X D ^a   Zalloum, O H Y ^a   Wojcik, J ^a   Knights, A P ^a   Mascher, P ^a   Todd, A D W ^b   Simpson, P J ^b  

^a MCMASTER UNIVERSITY   (Canada)

^b UNIVERSITY OF WESTERN ONTARIO   (Canada)

Author keywords

[No Author keywords available]

Indexed keywords

DEEXCITION PROCESS; LUMINESCENCE INTENSITY; POWER DENSITY; SI NANOCLUSTERS;

ACTIVATION ENERGY; ANNEALING; DOPING (ADDITIVES); ELECTRON CYCLOTRON RESONANCE; ERBIUM; HIGH TEMPERATURE EFFECTS; NUCLEATION; OXIDATION; PHOTOLUMINESCENCE; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; RUTHERFORD BACKSCATTERING SPECTROSCOPY; SILICA; SILICON;

NANOSTRUCTURED MATERIALS;

EID: 18844392037     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1894600     Document Type: Article

References (21)

1. G. Reed and A. P. Knights, Silicon Photonics: An Introduction (Wiley, New York, 2004).
2. S. Ossicini, L. Pavesi, and F. Priolo, Light Emitting Silicon for Microphotonics (Springer, New York, 2003).
3. G. Franzò, V. Vinciguerra, and F. Priolo, Appl. Phys. A: Mater. Sci. Process. 69, 3 (1999).
4. G. Franzò, D. Pacifici, V. Vinciguerra, F. Priolo, and F. Iacona, Appl. Phys. Lett. 76, 2167 (2000).
5. M. Zacharias, M. S. J. Heitmann, and P. Streitenberger, Physica E (Amsterdam) 11, 245 (2001).
6. T. Kimura, H. Isshiki, S. Ide, T. Shimizu, and T. Ishida, J. Appl. Phys. 93, 2595 (2003).
7. J. H. Jhe, J. H. Shin, K. J. Kim, and D. W. Moon, Appl. Phys. Lett. 82, 4489 (2003).
8. A. Polman, D. C. Jacobson, D. J. Eaglesham, R. C. Kistler, and J. M. Poate, J. Appl. Phys. 70, 3778 (1991).
9. J. P. Proot, C. Delerue, and G. Allan, Appl. Phys. Lett. 61, 1948 (1992).
10. M. Wojdak, M. F. M. Klik, O. B. Gusev, T. Gregorkiewicz, G. F. D. Pacifici, F. Priolo, and F. Iacona, Phys. Rev. B 69, 233315 (2004).
11. S. Seo, H. Han, and J. H. Shin, Mater. Res. Soc. Symp. Proc. 597, 21 (2000).
12. H. Han, S. Seo, J. H. Shin, and D. Kim, J. Appl. Phys. 88, 2160 (2000).
13. G. Franzò, S. Boninelli, D. Pacifici, F. Priolo, F. Iacona, and C. Bongiorno, Appl. Phys. Lett. 82, 3871 (2003).
14. M. Boudreau, M. Boumerzoug, P. Mascher, and P. E. Jessop, Appl. Phys. Lett. 63, 3014 (1993).
15. M. Volmer and A. Weber, Z. Phys. Chem., Stoechiom. Verwandtschaftsl. 119, 227 (1926).
16. R. Becher and W. Doring, Ann. Phys. 24, 719 (1935).
17. Towards the First Silicon Laser, edited by, L. Pavesi, S. Gaponenko, and, L. D. Negro, (Kluwer, New York, 2003).
18. L. A. Nesbit, Appl. Phys. Lett. 46, 38 (1985).
19. D. Tsoukalas, C. Tsamis, and P. Normand, J. Appl. Phys. 89, 7809 (2001).
20. A. Bongiorno and A. Pasquarello, Phys. Rev. Lett. 88, 125901 (2002).
21. E. L. Williams, J. Am. Ceram. Soc. 48, 190 (1965).