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Volumn , Issue , 2004, Pages 69-71
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Compositional and optical characterization of SiOx films deposited by ECR-PECVD for photonics applications
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Author keywords
[No Author keywords available]
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Indexed keywords
ANNEALING;
ATOMIC FORCE MICROSCOPY;
CHARACTERIZATION;
COMPOSITION;
ELLIPSOMETRY;
FOURIER TRANSFORM INFRARED SPECTROSCOPY;
NANOSTRUCTURED MATERIALS;
PHOTOLUMINESCENCE;
PHOTONS;
PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION;
REFRACTIVE INDEX;
SILICA;
FABRY-PEROT FRINGES;
NANOCRYSTALLINE SILICON MATERIALS;
OPTICAL CHARACTERIZATION;
PHOTONICS APPLICATIONS;
THIN FILMS;
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EID: 18844391735
PISSN: None
EISSN: None
Source Type: Conference Proceeding
DOI: None Document Type: Conference Paper |
Times cited : (2)
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References (13)
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