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Volumn 203-205, Issue , 2002, Pages 285-288

Internal friction of copper thin layers on silicon substrates

Author keywords

Copper films; Core diffusion; Dislocation relaxation; Internal friction

Indexed keywords

AMORPHOUS MATERIALS; COPPER; CRYSTALLINE MATERIALS; DAMPING; DIFFUSION IN SOLIDS; ELASTIC MODULI; INTERNAL FRICTION; METALLIC FILMS; SILICON NITRIDE; SILICON WAFERS; SUBSTRATES; THICKNESS MEASUREMENT;

EID: 18744430060     PISSN: 10120386     EISSN: 16629507     Source Type: Journal    
DOI: 10.4028/www.scientific.net/ddf.203-205.285     Document Type: Article
Times cited : (3)

References (17)
  • 4
    • 0006273960 scopus 로고    scopus 로고
    • CRYSTEC GmbH, Kristalltechnologie, Köpenicker Straße 325, D-12555 Berlin


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.