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Volumn 11, Issue 3, 2001, Pages
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Growth of BON thin films by plasma assisted MOCVD and study of deposition parameter effects on the film structure
a
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Author keywords
[No Author keywords available]
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Indexed keywords
ATOMIC FORCE MICROSCOPY;
BORON COMPOUNDS;
ELECTRIC CONDUCTIVITY;
ELECTRON DIFFRACTION;
FILM GROWTH;
FOURIER TRANSFORM INFRARED SPECTROSCOPY;
METALLORGANIC CHEMICAL VAPOR DEPOSITION;
PHASE COMPOSITION;
PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION;
SUBSTRATES;
SURFACE PROPERTIES;
SURFACE REACTIONS;
SURFACE STRUCTURE;
THERMAL EFFECTS;
ULTRAVIOLET SPECTROSCOPY;
X RAY PHOTOELECTRON SPECTROSCOPY;
BORON OXYNITROGEN (BON) COMPOUNDS;
SMOOTH SURFACES;
THIN FILMS;
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EID: 18744420101
PISSN: 11554339
EISSN: None
Source Type: Conference Proceeding
DOI: None Document Type: Conference Paper |
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Times cited : (2)
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References (21)
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