Comparison of an atmospheric pressure, radio-frequency discharge operating in the α and γ modes

Plasma Sources Science and Technology

Volumn 14, Issue 2, 2005, Pages 314-320

  Yang, X ^a   Moravej, M ^a   Nowling, G R ^a   Babayan, S E ^b   Panelon, J ^b   Chang, J P ^a   Hicks, R F ^a  

^a UNIVERSITY OF CALIFORNIA   (United States)

^b Surfx Technologies LLC   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL VAPOR DEPOSITION; ELECTRIC POTENTIAL; ELECTRODES; GLOW DISCHARGES; HELIUM; NITROGEN; PLASMAS; SILICON NITRIDE;

OPTICAL EMISSIONS; POWER DENSITY; RADIO-FREQUENCY DISCHARGES; RADIO-FREQUENCY PLASMAS;

ATMOSPHERIC PRESSURE;

EID: 18744376333     PISSN: 09630252     EISSN: None     Source Type: Journal    
DOI: 10.1088/0963-0252/14/2/013     Document Type: Article

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