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Volumn 467, Issue , 1997, Pages 615-620

a-Si:H and a-SiGe:H alloys fabricated close to powder regime of RF PECVD

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHOUS ALLOYS; AMORPHOUS SILICON; CHEMICAL VAPOR DEPOSITION; CRYSTAL DEFECTS; CRYSTAL MICROSTRUCTURE; ELECTRONIC DENSITY OF STATES; FERMI LEVEL; HYDROGEN BONDS; NANOSTRUCTURED MATERIALS; PHOTOCONDUCTIVITY; PLASMAS; SILICON COMPOUNDS;

EID: 0031356359     PISSN: 02729172     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1557/proc-467-615     Document Type: Conference Paper
Times cited : (3)

References (9)
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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.