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Volumn 163-164, Issue , 2003, Pages 695-702

Dual-anode magnetron sputtering

Author keywords

A12O3; Anode; Dielectrics; Magnetron; Reactive sputtering

Indexed keywords

ANODES; CLOSED LOOP CONTROL SYSTEMS; DIELECTRIC MATERIALS; ELECTRIC TRANSFORMERS;

EID: 0037472588     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0257-8972(02)00659-X     Document Type: Article
Times cited : (13)

References (16)
  • 7
    • 0012663093 scopus 로고
    • Ph.D. Thesis, University of Wisconsin-Madison
    • L.J. Mahoney, Ph.D. Thesis, University of Wisconsin-Madison, (1994).
    • (1994)
    • Mahoney, L.J.1
  • 12
    • 0000557901 scopus 로고
    • Reactive sputter deposition
    • S.M. Rossnagel, J.J. Cuomo, W.D. Westwood (Eds.), Noyes Public, Park Ridge, NJ
    • W.D. Westwood, Reactive sputter deposition, in: S.M. Rossnagel, J.J. Cuomo, W.D. Westwood (Eds.), Handbook of Plasma Processing Technology, Noyes Public, Park Ridge, NJ, 1990, p. 233.
    • (1990) Handbook of Plasma Processing Technology , pp. 233
    • Westwood, W.D.1


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.