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Applied Physics A: Materials Science and Processing

Volumn 80, Issue 7, 2005, Pages 1535-1540

Surface plasmon resonance of sputtered Ag films: Substrate and mass thickness dependence

(4) Xu, G a Tazawa, M a Jin, P a Nakao, S a

a NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY AIST (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

FREQUENCIES; FUNCTIONS; INFRARED RADIATION; MAGNETRON SPUTTERING; PERMITTIVITY; REFRACTIVE INDEX; RESONANCE;

MASS THICKNESS; RESONANCE WAVELENGTH; SILVER FILMS; SURFACE-ENHANCED SPECTROSCOPIES (SES);

METALLIC FILMS;

EID: 18544363911 PISSN: 09478396 EISSN: None Source Type: Journal
DOI: 10.1007/s00339-003-2395-y Document Type: Article

Times cited : (127)

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