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Diamond and Related Materials

Volumn 14, Issue 3-7, 2005, Pages 891-895

XPS and NEXAFS characterisation of plasma deposited vertically aligned N-doped MWCNT

(5) Point, S a Minea, T a Bouchet Fabre, B b Granier, A a Turban, G a

a UNIVERSITÉ DE NANTES (France)

b CEA SACLAY (France)

Author keywords

Carbon Nanotube; NEXAFS; PECVD; XPS

Indexed keywords

ATMOSPHERIC PRESSURE; CATALYSTS; CHARACTERIZATION; DOPING (ADDITIVES); ELECTRON CYCLOTRON RESONANCE; PLASMA APPLICATIONS; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; SCANNING ELECTRON MICROSCOPY; SYNTHESIS (CHEMICAL); TRANSMISSION ELECTRON MICROSCOPY; X RAY PHOTOELECTRON SPECTROSCOPY;

AIR CONTAMINATION; MAGNETIC TRAPS; TOTAL ELECTRON YIELD (TEY);

CARBON NANOTUBES;

EID: 18444380311 PISSN: 09259635 EISSN: None Source Type: Journal
DOI: 10.1016/j.diamond.2004.10.011 Document Type: Conference Paper

Times cited : (53)

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