Growth mechanism and properties of the large area well-aligned carbon nano-structures deposited by microwave plasma electron cyclotron resonance chemical vapor deposition

Diamond and Related Materials

Volumn 11, Issue 3-6, 2002, Pages 922-926

  Lin, Chao Hsun ^a   Chang, Hui Lin ^a   Tsai, Ming Her ^a   Kuo, Cheng Tzu ^a  

^a NATIONAL CHIAO TUNG UNIVERSITY   (Taiwan)

Author keywords

Carbon; Catalytic processes; Chemical vapor deposition (CVD); Electron cyclotron resonance (ECR)

Indexed keywords

CATALYST ACTIVITY; ELECTRON CYCLOTRON RESONANCE; GROWTH (MATERIALS); MORPHOLOGY; NANOSTRUCTURED MATERIALS; OXIDATION RESISTANCE; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; SCANNING ELECTRON MICROSCOPY; TRANSMISSION ELECTRON MICROSCOPY;

MICROWAVE PLASMA;

CARBON;

VAPOR DEPOSITION;

EID: 0036508460     PISSN: 09259635     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0925-9635(01)00640-9     Document Type: Article

References (17)