Growth and characterization of InAsN alloy films and quantum wells

Journal of Crystal Growth

Volumn 278, Issue 1-4, 2005, Pages 254-258

  Kuroda, M ^a   Nishikawa, A ^a   Katayama, R ^a   Onabe, K ^a  

^a UNIVERSITY OF TOKYO   (Japan)

Author keywords

A1. Optical properties; A1. X ray diffraction; A3. Molecular beam epitaxy; A3. Quantum wells; A3. Thin film; B1. Dilute nitrides

Indexed keywords

CRYSTAL GROWTH; MOLECULAR BEAM EPITAXY; NITRIDES; OPTICAL PROPERTIES; PHOTOLUMINESCENCE; SEMICONDUCTING INDIUM COMPOUNDS; SEMICONDUCTOR QUANTUM WELLS; THERMAL EFFECTS; X RAY DIFFRACTION ANALYSIS;

BAND EDGE; BURSTEIN-MOSS EFFECTS; CONDUCTION BAND; DILUTE NITRIDES;

THIN FILMS;

EID: 18444372979     PISSN: 00220248     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.jcrysgro.2005.01.075     Document Type: Conference Paper

References (9)

1. D.K. Shih, H.H. Lin, L.W. Sung, T.Y. Chu, and T.R. Yang Jpn. J. Appl. Phys. 42 2003 375
2. S. Nishio, A. Nishikawa, R. Katayama, K. Onabe, and Y. Shiraki J. Crystal Growth 251 2003 422
3. M. Kuroda, R. Katayama, S. Nishio, K. Onabe, and Y. Shiraki Phys. Stat. Sol. (c) 0 2003 2765
4. I.H. Ho, and G.B. Stringfellow J. Crystal Growth 178 1998 1
5. K. Onabe, D. Aoki, J. Wu, H. Yaguchi, and Y. Shiraki Phys. Stat. Sol. (a) 176 1999 231
6. S. Miyoshi, H. Yaguchi, K. Onabe, R. Ito, and Y. Shiraki Appl. Phys. Lett. 63 1993 3506
7. J.C. Fan, W.K. Hung, Y.F. Chen, J.S. Wang, and H.H. Lin Phys. Rev. B 62 2000 10990
8. A.A. El-Emawy, H.J. Zhmayev, J.H. Lee, D. Zubia, and M. Osinski Phys. Stat. Sol. (b) 228 2001 263
9. H. Naoi, Y. Naoi, and S. Sakai Solid-State Electron 41 1997 319