Optimization of Nanomachining Repair Conditions for ArF lithography

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5256, Issue 1, 2003, Pages 538-545

  Amano, Tsuyoshi ^a   Nishiguchi, Masaharu ^a   Hashimoto, Hiroyuki ^a   Morikawa, Yasutaka ^a   Hayashi, Naoya ^a   White, Roy ^b   Bozak, Ron ^b   Terrill, Lee ^b  

^a DAI NIPPON PRINTING CO LTD   (Japan)

^b RAVE LLC   (United States)

Author keywords

ArF lithography; Nanomachining; New repair technique

Indexed keywords

ION BEAMS; LITHOGRAPHY; MACHINING; OPTIMIZATION; PHASE SHIFT; QUARTZ;

NANOMACHINING; NEW REPAIR TECHNIQUE;

MASKS;

EID: 1842422567     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (5)

1. D. Brinkley, R. Bozak, B. Chiu, C. Ly, V. Tolani, R. White, "Investigation of Nanomachining for Geometry Reconstruction" Proceedings of SPIE Vol. 4889, 232-240, 2002.
2. B. LoBianco, et al, "Use of Nanomachining for 100nm Nanometer Mask Repair", BACUS2002, Proc. of SPIE Vol.4889, p909-921, 2002.
3. R. White, M. Verbeek, R. Bozak, M. Klos, "Use of Nanomachining as a Technique to Reduce Scrap of High End Photomasks" Proceedings of SPIE Vol. 4562, 213-224, 2001.
4. M. Verbeek, et al, "High precision mask repair using nanomachining", EMC2002.
5. Yasutaka Morikawa, Haruo Kokubo, Masaharu Nishiguchi, Naoya Hayashi, Roy White, Ron Bozak, Lee Terrill "Defect repair performance using the nanomachining repair technique" Proceedings of SPIE Vol. 5130, 520-527, 2003.