Physical properties and microstructure of sputter deposited aluminum and zirconium oxynitride multilayers

Surface and Coatings Technology

Volumn 174-175, Issue , 2003, Pages 266-272

  Rigato, V ^a   Patelli, A ^a   Maggioni, G ^a   Restello, S ^a   Vezzu S ^a   Cooke, K E ^b   Teer, D G ^b   Boscarino, D ^c   Figueras, A ^d   Depero, L E ^e   Bontempi, E ^e  

^a LABORATORI NAZIONALI DI LEGNARO   (Italy)

^b TEER COATINGS LTD   (United Kingdom)

^c Thin Films Srl   (Italy)

^d UNIVERSITAT AUTÒNOMA DE BARCELONA   (Spain)

^e UNIVERSITY OF BRESCIA   (Italy)

Author keywords

Multilayer; Oxidation; Oxynitrides; Reactive sputtering

Indexed keywords

COMPOSITION; MICROSTRUCTURE; MULTILAYERS; PROTECTIVE COATINGS; X RAY ANALYSIS;

X RAY REFLECTIVITY (XRR);

MAGNETRON SPUTTERING;

COATING; INDUSTRIAL APPLICATION; PLASMA; SURFACE PROPERTY;

EID: 18344416900     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0257-8972(03)00793-X     Document Type: Article

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