SCOPUS 정보 검색 플랫폼

Surface and Coatings Technology

Volumn 174-175, Issue , 2003, Pages 758-761

Nanoscale mutilayer TiN/BN films deposited by plasma enhanced chemical vapor deposition

(4) Lee, S H a Nam, K H a Lim, J W a Lee, J J a

a Seoul National University (South Korea)

Author keywords

Multilayer; PECVD; Template; TiN BN

Indexed keywords

COMPOSITION; ELECTRON DIFFRACTION; MULTILAYERS; THICKNESS MEASUREMENT; TITANIUM NITRIDE; X RAY DIFFRACTION ANALYSIS; X RAY PHOTOELECTRON SPECTROSCOPY;

PRECURSORS;

PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION;

COATING; INDUSTRIAL APPLICATION; PLASMA; SURFACE PROPERTY;

EID: 18144440786 PISSN: 02578972 EISSN: None Source Type: Journal
DOI: 10.1016/S0257-8972(03)00571-1 Document Type: Article

Times cited : (11)

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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.