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Volumn 41, Issue 8, 2005, Pages 503-504
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Effect of gate-source access region stress on current collapse in AlGaN/GaN HFETs
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Author keywords
[No Author keywords available]
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Indexed keywords
ELECTRIC CURRENTS;
ELECTRON BEAM LITHOGRAPHY;
GALLIUM NITRIDE;
METALLORGANIC CHEMICAL VAPOR DEPOSITION;
OPTOELECTRONIC DEVICES;
PASSIVATION;
SEMICONDUCTING ALUMINUM COMPOUNDS;
THRESHOLD VOLTAGE;
COPLANAR WAVEGUIDE;
DRAIN CURRENT;
ELECTRICAL ISOLATION;
GATE-TO-DRAIN REGION;
FIELD EFFECT TRANSISTORS;
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EID: 18144423165
PISSN: 00135194
EISSN: None
Source Type: Journal
DOI: 10.1049/el:20050336 Document Type: Article |
Times cited : (13)
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References (6)
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