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Volumn 351, Issue 14-15, 2005, Pages 1196-1201
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Microstructural and defect population change in electron beam irradiated Ge:SiO2 MCVD glasses in the conditions of refractive index change writing
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Author keywords
[No Author keywords available]
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Indexed keywords
GERMANIUM;
METALLORGANIC CHEMICAL VAPOR DEPOSITION;
MICROSTRUCTURE;
PARAMAGNETIC RESONANCE;
PHOTOLITHOGRAPHY;
RAMAN SPECTROSCOPY;
REFRACTIVE INDEX;
SILICA;
DEFECT POPULATION;
GERMANOSILICATE GLASSES;
REFRACTIVE INDEX CHANGE WRITING;
TRANSVERSE OPTICAL (TO);
ELECTRON BEAMS;
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EID: 18144395049
PISSN: 00223093
EISSN: None
Source Type: Journal
DOI: 10.1016/j.jnoncrysol.2005.03.010 Document Type: Article |
Times cited : (9)
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References (27)
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