Characterization of defects in waveguides formed by electron irradiation of silica-on-silicon

Journal of Lightwave Technology

Volumn 18, Issue 4, 2000, Pages 555-561

  Spaargaren, Susan M R ^a,b,c,d   Syms, Richard R A ^a,c,e,f  

^a IEEE

^b UNIVERSITY OF WESTERN AUSTRALIA   (Australia)

^c IMPERIAL COLLEGE LONDON   (United Kingdom)

^d UNIVERSITY COLLEGE LONDON   (United Kingdom)

^e UNIVERSITY OF OXFORD   (United Kingdom)

^f Worcester College ^*

Author keywords

[No Author keywords available]

Indexed keywords

OXYGEN HOLE CENTERS;

ABSORPTION SPECTROSCOPY; CRYSTAL DEFECTS; ELECTRON IRRADIATION; INTEGRATED OPTICS; OXYGEN; PARAMAGNETIC RESONANCE; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; REFRACTIVE INDEX; SEMICONDUCTING SILICON; SILICA;

OPTICAL WAVEGUIDES;

EID: 0033744445     PISSN: 07338724     EISSN: None     Source Type: Journal    
DOI: 10.1109/50.838130     Document Type: Article

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