Preparation of Bragg gratings in sputter-deposited GeO2-SiO2 glasses by excimer-laser irradiation

Optics Letters

Volumn 21, Issue 17, 1996, Pages 1360-1362

  Nishii, J ^a   Yamanaka, H ^a   Hosono, H ^b   Kawazoe, H ^b  

^a OSAKA NATIONAL RESEARCH INSTITUTE   (Japan)

^b TOKYO INSTITUTE OF TECHNOLOGY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ABSORPTION SPECTROSCOPY; DIFFRACTION GRATINGS; EXCIMER LASERS; IRRADIATION; MASKS; REFRACTIVE INDEX; SEMICONDUCTING GERMANIUM COMPOUNDS; SILICA; SPUTTER DEPOSITION; SURFACES; THICKNESS MEASUREMENT; THIN FILMS;

BRAGG GRATINGS; GERMANIUM OXIDE; PHASE MASKS; RADIOFREQUENCY SPUTTER DEPOSITION;

SEMICONDUCTING GLASS;

EID: 0030243582     PISSN: 01469592     EISSN: None     Source Type: Journal    
DOI: 10.1364/OL.21.001360     Document Type: Article

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