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Surface and Coatings Technology

Volumn 196, Issue 1-3 SPEC. ISS., 2005, Pages 226-230

Effect of electron temperature on the DLC film properties

(5) Ikenaga, Noriaki a Awazu, Kaoru b Sakudo, Noriyuki c Yasui, Haruyuki b Kawabata, Takeshi a

a JAPAN SCIENCE AND TECHNOLOGY AGENCY (Japan)

b INDUSTRIAL RESEARCH INSTITUTE OF ISHIKAWA (Japan)

c KANAZAWA INSTITUTE OF TECHNOLOGY (Japan)

Author keywords

Amorphous; DLC film; Electron temperature; Hardness; Hydrogen; PBII; Plasma source ion implantation; TRIM

Indexed keywords

CARRIER CONCENTRATION; COATINGS; DEPOSITION; FRICTION; HARDNESS; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; RAMAN SPECTROSCOPY; THERMAL EFFECTS; TRIBOLOGY; TUNGSTEN CARBIDE; WEAR OF MATERIALS;

ELECTRON TEMPERATURE; PLASMA CHEMISTRY; SCRATCH TESTS; SOLID-STATE STRUCTURES;

DIAMOND LIKE CARBON FILMS;

CHEMICAL VAPOR DEPOSITION;

EID: 18144382920 PISSN: 02578972 EISSN: None Source Type: Journal
DOI: 10.1016/j.surfcoat.2004.08.081 Document Type: Article

Times cited : (9)

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