DLC films formed by hybrid pulse plasma coating (HPPC) system

Surface and Coatings Technology

Volumn 136, Issue 1-3, 2001, Pages 172-175

  Awazu, K ^a,c   Sakudo, N ^b   Yasui, H ^c   Saji, E ^d   Okazaki, K ^e   Hasegawa, Y ^f   Ikenaga, N ^g   Kanda, K ^h   Nambo, Y ⁱ   Saitoh, K ^j  

^a Hokuriku Indust Advancement Center   (Japan)

^b KANAZAWA INSTITUTE OF TECHNOLOGY   (Japan)

^c INDUSTRIAL RESEARCH INSTITUTE OF ISHIKAWA   (Japan)

^d INDUSTRIAL TECHNOLOGY CENTER OF FUKUI PREFECTURE   (Japan)

^e Fujita Giken Co Ltd   (Japan)

^f Onward Ceramic Coating Co Ltd   (Japan)

^g Shibuya Kogyo Co Ltd   (Japan)

^h KANAZAWA UNIVERSITY   (Japan)

ⁱ Nicca Chemical Co Ltd   (Japan)

^j NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY AIST   (Japan)

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Author keywords

[No Author keywords available]

Indexed keywords

INTERFEROMETERS; PARTIAL PRESSURE; PLASMA DENSITY; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION;

HYBRID PULSE PLASMA COATING (HPPC) SYSTEMS;

DIAMOND FILMS;

EID: 0035254251     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0257-8972(00)01051-3     Document Type: Article

References (5)

1. J.V. Mantese, I. G. Brown, N.W. Cheung, G.A. Collins, MRS Bull. (1996-8) 52.
2. N. Sakudo, K. Awazu, H. Yasui et al., Development of Hybrid Pulse Plasma Coating System, to be published in this proceedings.
3. H. Watanabe, K. Awazu, H. Yoshida, K. Takahashi, M. Iwaki, Diamond Relat. Mater. 3 (1994) 1117.
4. K. Awazu, H. Yoshida, H. Watanabe, M. Iwaki, L. Guzman, Surf. Coat. Technol. 51 (1992) 509.
5. M. Iwaki, H. Watanabe, Nucl. Instrum. Methods B141 (1998) 206.