Polycrystalline silicon thin-film transistor technology for flexible large-area electronics

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 4295, Issue , 2001, Pages 102-107

  Tung, Y J ^a   Carey, P G ^a   Smith, P M ^a   Theiss, S D ^a   Wickboldt, P ^a   Meng, X ^a   Weiss, R E ^a   Davis, G A ^a   Aebi, V W ^a   King, T J ^a  

^a UNIVERSITY OF CALIFORNIA   (United States)

Author keywords

Excimer laser anneal; Flexible substrates; Low temperature processing; Polysilicon TFTs

Indexed keywords

AMORPHOUS FILMS; ANNEALING; CRYSTALLIZATION; DIELECTRIC FILMS; EXCIMER LASERS; POLYSILICON; SPUTTER DEPOSITION; SUBSTRATES;

EXCIMER LASER ANNEALING; PLASTIC SUBSTRATES;

THIN FILM TRANSISTORS;

EID: 17944371604     PISSN: 0277786X     EISSN: None     Source Type: Journal    
DOI: 10.1117/12.424862     Document Type: Article

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