Iron and cobalt silicide catalysts-assisted carbon nanostructures on the patterned Si substrates

Thin Solid Films

Volumn 420-421, Issue , 2002, Pages 219-224

  Chang, Hui Lin ^a   Lin, Chao Hsun ^a   Kuo, Cheng Tzu ^a  

^a NATIONAL CHIAO TUNG UNIVERSITY   (Taiwan)

Author keywords

Carbon; Catalysis; Chemical vapor deposition; Field emission

Indexed keywords

CARBON NANOTUBES; CATALYSIS; COBALT COMPOUNDS; IRON; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; SILICON; SUBSTRATES;

CARBON NANOSTRUCTURES;

NANOSTRUCTURED MATERIALS;

EID: 17744416528     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(02)00749-6     Document Type: Conference Paper

References (33)

1. Iijima S. Nature (Lond.). 354:1991;56.
2. Treacy M.M.J., Ebbesen T.W., Gibson J.M. Nature (Lond.). 381:1996;678.
3. Ebbseen T.W., Lezec H.J., Hiura H., Bennett J.W., Ghaemi H.F., Thio T. Nature. 382:1996;54.
4. de Heer W.A., Chatelain W.A., Ugarte D.A. Science. 270:1995;1179.
5. Liu J., Rinzler A.G., Dai H., Hafner J.H., Bradley R.K., Boul P.J., Lu A., Iverson T., Shelimov K., Huffman C.B., Rodriguez-Macias F., Shon Y.S., Lee T.R., Colbert D.T., Smalley R.E. Science. 280:1998;1253.
6. Dai H., Hafner J.H., Rinzler A.G., Rinzler D.T., Colbert D.T., Smalley R.E. Nature. 384:1996;147.
7. Ito F., Konuma K., Okamoto A. J. Appl. Phys. 89:2001;8141.
8. Che G., Lakshmi B.B., Fisher E.R., Martin C.R. Nature. 384:1996;147.
9. Collins P.G., Zettle A., Bando H., Thess A., Smally R.E. Science. 278:1997;100.
10. Che G., Lakshmi B.B., Fisher E.R., Martin C.R. Nature. 393:1998;346.
11. Zhao Q., Wood J.R., Wagner H.D. Appl. Phys. Lett. 78:2001;1748.
12. Journet C., Maser W.K., Bernier P., Loiseau A., Lamy de la Chapelle M., Lefrant S., Deniered P., Lee R., Ficher J.E. Nature. 308:1997;756.
13. Franklin N.R., Dai H. Adv. Mater. 12:2000;890.
14. Lee Y.H., Jang Y.T., Choi C.H., Kim D.H., Lee C.W., Lee J.E., Han Y.S., Yoon S.S., Shin J.K., Kim S.T., Kim E.K., Ju B.K. Adv. Mater. 13:2001;1371.
15. Han Y.S., Shin J.K., Kim S.T. J. Appl. Phys. 90:2001;5731.
16. Ng K.K., Lynch W.T. IEEE Trans. Electron. Devices. ED-34:1987;503.
17. Tasi S.H., Chao C.W., Lee C.L., Shih H.C. Appl. Phys. Lett. 74:1999;3462.
18. Fan S., Chapline M.G., Franklin N.R., Tombler T.W., Cassell A.M., Dai H. Science. 283:1999;512.
19. Andrews R., Jacques D., Rao A.M., Derbyshire F., Qian D., Fan X., Dickey E.C., Chen J. Chem. Phys. Lett. 303:1999;467.
20. Lin C.H., Chang H.L., Kuo C.T. Diam. Relat. Mater. 11:2002;922.
21. Bower C., Zhu W., Jin S., Zhou O. Appl. Phys. Lett. 77:2000;830.
22. Avigal Y., Kalish R. Appl. Phys. Lett. 78:2001;2291.
23. Srivastava A., Srivastava A.K., Srivastava O.K. Carbon. 39:2001;201.
24. Merkulov V.I., Melechko A.V., Guillorn M.A., Lowndes D.H., Simpson M.L. Appl. Phys. Lett. 79:2001;2970.
25. Saito Y. Carbon. 33:1995;979.
26. Lee C.J., Park J. Appl. Phys. Lett. 77:2000;3397.
27. Kovalevski V.V., Safronov A.N. Carbon. 36:1998;963.
28. Ma X., Wang E.G. Appl. Phys. Lett. 78:2001;978.
29. Chang H.L., Lin C.H., Kuo C.T. Diam. Relat. Mater. 11:2002;793.
30. Spitzl R., Raiko V., Heiderhoff R., Gnaser H., Engemann J. Diam. Relat. Mater. 4:1995;563.
31. Sung S.L., Guo X.J., Huang K.P., Chen F.R., Shih H.C. Thin Solid Films. 315:1998;345.
32. Merkulov V.I., Lowndes D.H., Baylor L.R., Kang S. Solid State Electron. 45:2001;949.
33. Amaratangta G.A.J., Silva S.R.P. Appl. Phys. Lett. 68:1996;2529.