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Thin Solid Films

Volumn 315, Issue 1-2, 1998, Pages 345-350

The strengthening mechanism of DLC film on silicon by MPECVD

(5) Sung, S L a Guo, X J a Huang, K P b Chen, F R a Shih, H C a,b

a NATIONAL TSING HUA UNIVERSITY (Taiwan)

b NATIONAL CHUNG HSING UNIVERSITY (Taiwan)

Author keywords

Diamond like carbon; Microwave plasma enhanced chemical vapor deposition; Silicon

Indexed keywords

ARGON; CHEMICAL VAPOR DEPOSITION; HARDNESS; HYDROGEN; METHANE; NANOSTRUCTURED MATERIALS; SILICON CARBIDE; SILICON WAFERS; TRANSMISSION ELECTRON MICROSCOPY;

MICROWAVE PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION (MPECVD);

DIAMOND FILMS;

EID: 0032473185 PISSN: 00406090 EISSN: None Source Type: Journal
DOI: 10.1016/S0040-6090(97)00782-7 Document Type: Article

Times cited : (15)

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