SCOPUS 정보 검색 플랫폼

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 40, Issue 12, 2001, Pages 6705-6710

Chemical treatment effects on Si(111) surfaces in aqueous NaF solution

Author keywords

AFM; Chemical cleaning; Chemical etching; Contact angle; Native oxide; Si; Spectroscopic ellipsometry; Surface roughness

Indexed keywords

ATOMIC FORCE MICROSCOPY; CLEANING; CONTACT ANGLE; ELLIPSOMETRY; ETCHING; HYDROPHILICITY; HYDROPHOBICITY; OXIDES; SODIUM COMPOUNDS; SURFACE TREATMENT; WETTING; X RAY PHOTOELECTRON SPECTROSCOPY;

CHEMICAL TREATMENT EFFECTS; SODIUM FLUORIDE; SPECTROSCOPIC ELLIPSOMETRY; SURFACE MICROROUGHNESS; WETTABILITY MEASUREMENT;

SEMICONDUCTING SILICON;

EID: 0035710440 PISSN: 00214922 EISSN: None Source Type: Journal
DOI: 10.1143/jjap.40.6705 Document Type: Article

Times cited : (12)

References (39)

1
- 21544465957
- (1988) J. Appl. Phys. , vol.64 , pp. 3516
- Takahagi, T.¹ Nagai, I.² Ishitani, A.³ Kuroda, H.⁴ Nagasawa, Y.⁵

2
- 84929177658
- (1988) J. Vac. Sci. Technol. A , vol.7 , pp. 2104
- Chabel, Y.J.¹ Higashi, G.S.² Raghavacharim, K.³ Burrows, V.A.⁴

3
- 21544433109
- (1990) Appl. Phys. Lett. , vol.56 , pp. 656
- Higashi, G.S.¹ Chabel, Y.J.² Trucks, G.W.³ Raghavachari, K.⁴

4
- 4244071099
- (1991) Chem. Phys. Lett. , vol.181 , pp. 537
- Dumas, P.¹ Chabal, Y.J.²

5
- 36448999381
- (1995) J. Appl. Phys. , vol.78 , pp. 3801
- Houston, M.R.¹ Maboudian, R.J.²

6
- 0029288419
- (1995) Jpn. J. Appl. Phys. , vol.34 , pp. 1723
- Levenets, V.V.¹ Beklemishev, V.I.² Kirilenko, E.P.³ Makhonin, I.I.⁴ Trifonov, A.Y.⁵ Loginov, B.A.⁶ Protasenko, V.V.⁷

7
- 0001202763
- (1996) J. Appl. Phys. , vol.80 , pp. 5422
- Adachi, S.¹ Arai, T.² Kobayashi, K.³

8
- 0033221275
- (1999) Appl. Surf. Sci. , vol.152 , pp. 177
- Kawabata, Y.¹ Adachi, S.²

9
- 0033881523
- (2000) Mater. Sci. Eng. B , vol.68 , pp. 175
- Tomita, N.¹ Kawabata, Y.² Adachi, S.³

10
- 0003601534
- eds. M. Windholz, S. Budayri, L. Y. Stroumtsos and M. N. Fertig (Merck & Co., Rahway); 9th ed.
- (1976) The Merck Index

11
- 24244452897
- (1981) Appl. Phys. Lett. , vol.39 , pp. 316
- Aspnes, D.E.¹ Studna, A.A.²

12
- 0001546005
- (1993) J. Appl. Phys. , vol.73 , pp. 3467
- Utani, K.¹ Suzuki, T.² Adachi, S.³

13
- 0003808259
- (North-Holland, Amsterdam)
- (1977) Ellipsometry and Polarized Light
- Azzam, R.M.A.¹ Bashara, N.M.²

14
- 33847596250
- (1983) Phys. Rev. B , vol.27 , pp. 985
- Aspnes, D.E.¹ Studna, A.A.²

15
- 35949035159
- (1979) Phys. Rev. B , vol.20 , pp. 3292
- Aspnes, D.E.¹ Theeten, J.B.² Hottier, F.³

16
- 0008406557
- (1989) Fresen. Z. Anal. Chem. , vol.333 , pp. 527
- Mühlhoff, L.¹ Bolze, T.²

17
- 0008320331
- (1991) J. Appl. Phys. , vol.70 , pp. 3970
- Salimian, S.¹ Delfino, M.J.²

18
- 36448999381
- (1995) J. Appl. Phys. , vol.78 , pp. 3801
- Houston, M.R.¹ Maboudian, R.J.²

19
- 0032529983
- (1998) J. Appl. Phys. , vol.84 , pp. 3226
- Detavernier, C.¹ Van Meirhaeghe, R.L.² Donaton, R.³ Maex, K.⁴ Cardon, F.⁵

20
- 0024608286
- (1989) J. Electrochem. Soc. , vol.136 , pp. 484
- Zazzera, L.A.¹ Moulder, J.F.²

21
- 84957280263
- (1989) J. Vac. Sci. Technol. A , vol.7 , pp. 1719
- Van Der Heide, P.A.M.¹ Baan Hofman, M.J.² Ronde, H.J.³

22
- 0002636546
- (1993) Appl. Phys. Lett. , vol.63 , pp. 78
- Lau, W.M.¹ Huang, L.J.² Chang, W.H.³ Vos, M.⁴ Mitchell, I.V.⁵

23
- 0031220680
- (1997) Jpn. J. Appl. Phys. , vol.36 , pp. 5507
- Ohwaki, T.¹ Takeda, M.² Takai, Y.³

24
- 0024067478
- (1988) Surf. Interface Anal. , vol.11 , pp. 577
- Tanuma, S.¹ Powell, C.J.² Penn, D.R.³

25
- 0022957868
- (1986) Mater. Sci. Rep. , vol.1 , pp. 65
- Grunthaner, F.J.¹ Grunthaner, P.J.²

26
- 0028423526
- (1994) Jpn. J. Appl. Phys. , vol.33 , pp. 2689
- Suzuki, T.¹ Adachi, S.²

27
- 0014800514
- (1970) RCA Rev. , vol.31 , pp. 187
- Kern, W.¹ Puotinen, D.²

28
- 0014794693
- (1970) RCA Rev. , vol.31 , pp. 207
- Kern, W.¹

29
- 0028380131
- (1994) J. Electrochem. Soc. , vol.141 , pp. 366
- Kikuyama, H.¹ Waki, M.² Miyashita, M.³ Yabune, T.⁴ Miki, N.⁵ Takano, J.⁶ Ohmi, T.⁷

30
- 0032046525
- (1998) Jpn. J. Appl. Phys. , vol.37 , pp. 2330
- Matsui, M.¹ Uchida, F.² Kojima, M.³ Tokunaga, T.⁴ Yamazaki, K.⁵ Katsuyama, K.⁶ Arai, H.⁷

31
- 0001468784
- (1991) Appl. Phys. Lett. , vol.58 , pp. 2975
- Kasi, S.R.¹ Liehr, M.² Cohen, S.³

32
- 0000813328
- (1990) J. Appl. Phys. , vol.68 , pp. 5155
- Gräf, D.¹ Grundner, M.² Schultz, R.³ Mühlhoff, L.⁴

33
- 0008397090
- (1991) Solid State Technol. , vol.34 , pp. 43
- Hirose, M.¹ Yasakura, T.² Takakura, M.³ Miyazaki, S.⁴

34
- 0008394565
- (1968) J. Opt. Soc. Am. , vol.58 , pp. 73
- Smith, T.¹

35
- 0016059442
- (1974) J. Electrochem. Soc. , vol.121 , pp. 669
- Frieser, R.G.¹

36
- 27944482824
- (1974) Appl. Phys. Lett. , vol.25 , pp. 531
- Williams, R.¹ Goodman, A.M.²

37
- 0024030296
- (1988) J. Electrochem. Soc. , vol.135 , pp. 1535
- Gould, G.¹ Irene, E.A.²

38
- 0026908218
- (1992) J. Electrochem. Soc. , vol.139 , pp. 2299
- Bäcklund, Y.¹ Hermansson, K.² Smith, L.³

39
- 0022662543
- (1986) Appl. Phys. A , vol.39 , pp. 73
- Grundner, M.¹ Jacob, H.²

* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.