Yttrium nitride thin films grown by reactive laser ablation

Journal of Physics and Chemistry of Solids

Volumn 64, Issue 11, 2003, Pages 2273-2279

  De La Cruz, W ^a,b   Daz J A ^a   Mancera, L ^a   Takeuchi, N ^a   Soto, G ^a  

^a UNIVERSIDAD NACIONAL AUTÓNOMA DE MÉXICO   (Mexico)

^b Institute of Physics   (United States)

Author keywords

A. Thin films; B. Plasma deposition; C. Ab initio calculations; C. Electron energy loss spectroscopy; C. Photoelectron spectroscopy

Indexed keywords

AUGER ELECTRON SPECTROSCOPY; COMPOSITION; DOPING (ADDITIVES); ELECTRON ENERGY LOSS SPECTROSCOPY; ELLIPSOMETRY; FILM GROWTH; LASER ABLATION; METALLIC FILMS; NITROGEN; OXYGEN; X RAY PHOTOELECTRON SPECTROSCOPY;

PLASMA DEPOSITION;

YTTRIUM COMPOUNDS;

EID: 17644435597     PISSN: 00223697     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0022-3697(03)00259-2     Document Type: Article

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