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Volumn 17, Issue 8, 2005, Pages 2076-2080

Amino acids as complexing agents in chemical-mechanical planarization of copper

Author keywords

[No Author keywords available]

Indexed keywords

BARRIER MATERIALS; OXIDIZING AGENTS; PLANARIZATION; RATE SELECTIVITY;

EID: 17644419968     PISSN: 08974756     EISSN: None     Source Type: Journal    
DOI: 10.1021/cm048478f     Document Type: Article
Times cited : (48)

References (37)
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    • Materials Research Society Symposium Proceedings, Warrendale, PA, 2002; Elsevier: New York
    • In Chemical-Mechanical Planarization, Materials Research Society Symposium Proceedings, Warrendale, PA, 2002; Babu, S. V., Singh, R. K., Hayasaka, N., Oliver, M., Eds.; Elsevier: New York, 2002; Vol. 732E.
    • (2002) Chemical-mechanical Planarization , vol.732 E
    • Babu, S.V.1    Singh, R.K.2    Hayasaka, N.3    Oliver, M.4
  • 11
    • 17644363166 scopus 로고    scopus 로고
    • Materials Research Society Symposium Proceedings, Warrendale, PA, 2001; Babu, S. V., Cadien, K. C., Yano, H., Eds.; Elsevier: New York
    • Kawahasi, N.; Hattori, M. In Chemical-Mechanical Polishing- Advances and Future Challenges, Materials Research Society Symposium Proceedings, Warrendale, PA, 2001; Babu, S. V., Cadien, K. C., Yano, H., Eds.; Elsevier: New York, 2001; Vol. 671, M2.2.1.
    • (2001) Chemical-mechanical Polishing - Advances and Future Challenges , vol.671
    • Kawahasi, N.1    Hattori, M.2
  • 21
    • 0034433714 scopus 로고    scopus 로고
    • Materials Research Society Symposium Proceedings, Warrendale, PA, 2000; Singh, R. K., Bajaj, R., Meuris, M., Moinpour, M., Maury, A., Eds.; Elsevier: New York
    • Lee, S.-M.; Mahajan, U.; Chen, Z.; Singh R. K. In Chemical-Mechanical Polishing 2000- Fundamentals and Material Issues, Materials Research Society Symposium Proceedings, Warrendale, PA, 2000; Singh, R. K., Bajaj, R., Meuris, M., Moinpour, M., Maury, A., Eds.; Elsevier: New York, 2000; Vol. 613, E7.8.1.
    • (2000) Chemical-mechanical Polishing 2000 - Fundamentals and Material Issues , vol.613
    • Lee, S.-M.1    Mahajan, U.2    Chen, Z.3    Singh, R.K.4
  • 26
    • 0035560016 scopus 로고    scopus 로고
    • Materials Research Society Symposium Proceedings, Warrendale, PA, 2001; Babu, S. V., Cadien, K. C., Yano, H., Eds.; Elsevier: New York
    • Jindal, A.; Li, Y.; Babu, S. V. In Chemical-Mechanical Polishing-Advances and Future Challenges, Materials Research Society Symposium Proceedings, Warrendale, PA, 2001; Babu, S. V., Cadien, K. C., Yano, H., Eds.; Elsevier: New York, 2001; Vol. 671, M6.8.1.
    • (2001) Chemical-mechanical Polishing-advances and Future Challenges , vol.671
    • Jindal, A.1    Li, Y.2    Babu, S.V.3
  • 28
    • 17644426169 scopus 로고    scopus 로고
    • Materials Research Society Symposium Proceedings, Warrendale, PA, 2003; Boning, D. S., Devriendt, K., Oliver, M. R., Stein, D. J., Vos, I., Eds.; Elsevier: New York
    • Wang, L.; Doyle, F. M. In Chemical-Mechanical Planarization, Materials Research Society Symposium Proceedings, Warrendale, PA, 2003; Boning, D. S., Devriendt, K., Oliver, M. R., Stein, D. J., Vos, I., Eds.; Elsevier: New York, 2003; Vol. 767, F6.5.1.
    • (2003) Chemical-mechanical Planarization , vol.767
    • Wang, L.1    In, D.F.M.2
  • 32
    • 26444563031 scopus 로고
    • Karash, N., Meyers, C. Y., Eds.; Pergamon Press: Oxford, U.K.
    • Savige, W. E.; Maclaren, J. A. In Organic Sulphur Compounds; Karash, N., Meyers, C. Y., Eds.; Pergamon Press: Oxford, U.K., 1966; Vol. 2.
    • (1966) Organic Sulphur Compounds , vol.2
    • Savige, W.E.1    Maclaren, J.A.2


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.