Absolute dose calibration in PIII

Surface and Coatings Technology

Volumn 186, Issue 1-2 SPEC. ISS., 2004, Pages 29-33

  Manova, D ^a   Scholze, F ^a   Mändl, Stephan ^a   Neumann, H ^a   Rauschenbach, B ^a  

^a LEIBNIZ INSTITUTE OF SURFACE ENGINEERING IOM   (Germany)

Author keywords

Dose measurement; PIII; Simulation; Thermal probe

Indexed keywords

COMPUTER SIMULATION; DOSIMETRY; ERROR ANALYSIS; ION IMPLANTATION; PYROMETERS; SEMICONDUCTOR DEVICES; THERMAL CONDUCTIVITY; TRIBOLOGY;

INCIDENT ION FLUX; PLASMA IMMERSION ION IMPLANTATION (PIII); SEMICONDUCTOR INDUSTRY; THERMAL PROBES;

PLASMA THEORY;

CALIBRATION;

EID: 17644368931     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.surfcoat.2004.04.033     Document Type: Article

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