Characterization of a broad ion beam source by determination of the energy flux

Surface and Coatings Technology

Volumn 174-175, Issue , 2003, Pages 918-921

  Kersten, H ^a   Wiese, R ^a   Gorbov, D ^b   Kapitov, A ^b   Scholze, F ^c   Neumann, H ^c  

^a UNIVERSITY OF GREIFSWALD   (Germany)

^b ST PETERSBURG STATE UNIVERSITY   (Russian Federation)

^c LEIBNIZ INSTITUTE OF SURFACE ENGINEERING IOM   (Germany)

Author keywords

Energy influx; Ion beam; Thermal probe

Indexed keywords

ION SOURCES; MICROWAVES; SUBSTRATES; THERMAL EFFECTS;

BEAM VOLTAGE;

INTERFACIAL ENERGY;

COATING; INDUSTRIAL APPLICATION; PLASMA; SURFACE PROPERTY;

EID: 0041852599     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0257-8972(03)00324-4     Document Type: Article

References (5)

1. Vukusic J. Bengtsson J. Ghisoni M. Larsson A. Carlstrom C.F. Landgren G. Appl. Opt. 39 2000 398
2. Frost F. Lippold G. Otte K. Hirsch D. Schindler A. Bigl F. J. Vac. Sci. Technol., Part A 17 1999 793
3. Kersten H. Deutsch H. Steffen H. Kroesen G.M.W. Hippler R. Vacuum 63 2001 385
4. Zeuner M. Meichsner J. Neumann H. Scholze F. Bigl F. J. Appl. Phys. 80 1996 611
5. Kersten H. Deutsch H. Otte M. Swinkels G. Kroesen G.M.W. Thin Solid Films 377-378 2000 530