Effect of laser parameters on the exposure and selective etch rate in photostructurable glass

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 4637, Issue , 2002, Pages 404-412

  Livingston, Frank E ^a   Hansen, William W ^a   Huang, Adam ^a   Helvajian, Henry ^a  

^a AEROSPACE CORPORATION   (United States)

Author keywords

3D fabrication; Laser microfabrication; MEMS and microtechnology; Photostructurable glass ceramic; Volumetric patterning

Indexed keywords

ETCHING; GLASS CERAMICS; LASER BEAM EFFECTS; LASER PULSES; MICROELECTROMECHANICAL DEVICES; MICROSTRUCTURE; ULTRAVIOLET RADIATION;

PHOTOSTRUCTURABLE GLASS;

MICROELECTRONIC PROCESSING;

EID: 0036407612     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.470631     Document Type: Conference Paper

References (8)

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