Silicon cluster formation in the laser ablation of SiO at 308 nm

Applied Physics A: Materials Science and Processing

Volumn 80, Issue 8, 2005, Pages 1671-1675

  Torres, R ^a   Jadraque, M ^a   Martin, M ^a  

^a INSTITUTO DE QUÍMICA FÍSICA ROCASOLANO   (Spain)

Author keywords

[No Author keywords available]

Indexed keywords

COMPOSITION; IONIZATION; LASER ABLATION; LASER BEAMS; MASS SPECTROMETRY; MAXWELL EQUATIONS; SILICON; TEMPERATURE MEASUREMENT; THERMAL PLUMES;

LINEAR DEPENDENCE; PLUME COMPOSITION; PLUME DYNAMICS; SILICON CLUSTERS;

SILICON COMPOUNDS;

EID: 17444428141     PISSN: 09478396     EISSN: None     Source Type: Journal    
DOI: 10.1007/s00339-004-2559-4     Document Type: Article

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