Silicon cluster formation by molecular ion irradiation - Relationship between irradiated ion species and cluster yield

Applied Surface Science

Volumn 178, Issue 1-4, 2001, Pages 127-133

  Yamamoto, Hiroyuki ^a   Saito, Takeru ^a   Asaoka, Hidehito ^a  

^a JAPAN ATOMIC ENERGY AGENCY   (Japan)

Author keywords

Clusters; Ion solid interactions; Secondary ion mass spectroscopy; Semiconducting surfaces; Silicon

Indexed keywords

ARGON; ION BEAMS; ION BOMBARDMENT; SECONDARY ION MASS SPECTROMETRY; SPUTTERING; XENON;

MOLECULAR ION IRRADIATION;

SEMICONDUCTING SILICON;

EID: 0035796968     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0169-4332(01)00250-1     Document Type: Article

References (11)