Optical spectroscopy of emission from Si-SiO x nanoclusters formed by laser ablation

Applied Surface Science

Volumn 96-98, Issue , 1996, Pages 251-260

  Movtchan, I A ^a   Marine, W ^a   Dreyfusa, R W ^a   Le, H C ^a   Sentis, M ^a   Autric, M ^a  

^a AIX MARSEILLE UNIVERSITY   (France)

Author keywords

[No Author keywords available]

Indexed keywords

ARGON; EMISSION SPECTROSCOPY; HELIUM; LASER ABLATION; LASER PRODUCED PLASMAS; LIGHT EMISSION; OPTICAL VARIABLES MEASUREMENT; OXYGEN; PHOTOLUMINESCENCE; SEMICONDUCTING SILICON; SEMICONDUCTING SILICON COMPOUNDS; THIN FILMS;

LASER INDUCED PLASMA PLUME; OPTICAL TIME OF FLIGHT MEASUREMENTS; PLUME DYNAMICS; SILICON NANOCLUSTERS ABSORPTION BANDS;

SEMICONDUCTOR MATERIALS;

EID: 0030562885     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/0169-4332(95)00429-7     Document Type: Article

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