Analysis of the photochemical reaction on the surface for room temperature deposition of SiO2 thin films by photo-CVD using vacuum ultraviolet light

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 44, Issue 2, 2005, Pages 1019-1021

  Yokotani, Atsushi ^a   Amari, Kouichi ^a   Maezono, Yoshinari ^a,c   Toshikawa, Kiyohiko ^a,b   Kurosawa, Kou ^a  

^a UNIVERSITY OF MIYAZAKI   (Japan)

^b Miyazaki Oki Electric Co Ltd   (Japan)

^c UNIVERSITY OF TSUKUBA   (Japan)

Author keywords

Photochemical reaction and room temperature deposition; SiO2 film; TEOS; Two stages; Vacuum ultraviolet light

Indexed keywords

ABSORPTION SPECTROSCOPY; ADSORPTION; CHEMICAL BONDS; CHEMICAL VAPOR DEPOSITION; DEPOSITION; DISSOCIATION; FOURIER TRANSFORM INFRARED SPECTROSCOPY; PHOTOCHEMICAL REACTIONS; SILICA; ULTRAVIOLET RADIATION; VACUUM;

ROOM TEMPERATURE DEPOSITION; SIO2 FILM; TEOS; TWO STAGES; VACUUM ULTRAVIOLET LIGHT;

THIN FILMS;

EID: 17444375715     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/JJAP.44.1019     Document Type: Article

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