SIO 2 thin film preparation using dielectric barrier discharge-driven excimer lamps

Applied Surface Science

Volumn 138-139, Issue 1-4, 1999, Pages 340-343

  Takezoe, Noritaka ^a   Yokotani, Atsushi ^a   Kurosawa, Kou ^a   Sasaki, Wataru ^a   Igarashi, Tatsushi ^b   Matsuno, Hiromitsu ^b  

^a UNIVERSITY OF MIYAZAKI   (Japan)

^b USHIO INC   (Japan)

Author keywords

Excimer lamp; Metal organic compounds; Photochemical vapor deposition; Silicon dioxide; Vacuum ultra violet radiation

Indexed keywords

EID: 0347812904     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0169-4332(98)00415-2     Document Type: Article

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