Characterization of SiO2 Films Deposited by VUV-CVD Using Organic Siloxane Gases

IEEJ Transactions on Electronics, Information and Systems

Volumn 123, Issue 5, 2003, Pages 858-863

  Miyano, Junichi ^a   Yokotani, Atsushi ^b   Kurosawa, Kou ^b  

^a Miyazaki Oki Electric Co Ltd   (Japan)

^b UNIVERSITY OF MIYAZAKI   (Japan)

Author keywords

Chemical Vapor Deposition; Excimer lamp; Siloxane; Vacuum Ultraviolet

Indexed keywords

EID: 17444408093     PISSN: 03854221     EISSN: 13488155     Source Type: Journal    
DOI: 10.1541/ieejeiss.123.858     Document Type: Article

References (7)

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