A single precursor photolitic chemical vapor deposition of silica film using a dielectric barier discharge xenon excimer lamp

Applied Physics Letters

Volumn 69, Issue 10, 1996, Pages 1399-1401

  Yokotani, Atsushi ^a   Takezoe, Noritaka ^a   Kurosawa, Kou ^a   Igarashi, Tatsushi ^b   Matsuno, Hiromitu ^b  

^a UNIVERSITY OF MIYAZAKI   (Japan)

^b USHIO INC   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0001503549     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.117594     Document Type: Article

References (5)

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5. P. Bergonzo, U. Kogelschatz, and I. W. Boyed, Appl. Surf. Sci. 69, 393 (1993).