Effects of axial magnetic field on neutral beam etching by low-angle forward-reflected neutral beam method

Japanese Journal of Applied Physics, Part 2: Letters

Volumn 44, Issue 1-7, 2005, Pages

  Lee, Dohaing ^a   Park, ByungJae ^a   Yeom, Geunyoung ^a  

^a Sungkyunkwan University   (South Korea)

Author keywords

Etching; Low damage; Low angle reflection; Magnetic field; Neutral beam; SiO2

Indexed keywords

ETCHING; INDUCTIVELY COUPLED PLASMA; ION SOURCES; MAGNETIC FIELDS; MAGNETIC FLUX; MAGNETIZATION; MASS SPECTROMETERS; REFLECTION; SCHEMATIC DIAGRAMS; SILICA;

LOW DAMAGES; LOW-ANGLE REFLECTION; NEUTRAL BEAMS; SIO2;

ION BEAMS;

EID: 17444370194     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/JJAP.44.L63     Document Type: Article

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