Selectivity investigation of HfO2 to oxide using wet etching

2004 Semiconductor Manufacturing Technology Workshop Proceedings, SMTW

Volumn , Issue , 2004, Pages 87-90

  Kang, Tsung Kuei ^a   Wang, Chih Cheng ^b   Tsui, Bing Yue ^c   Li, Yuan Hsin ^b  

^a FENG CHIA UNIVERSITY   (Taiwan)

^b Grand Plastic Technology Corporation   (Taiwan)

^c NATIONAL CHIAO TUNG UNIVERSITY   (Taiwan)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL VAPOR DEPOSITION; ETCHING; GATES (TRANSISTOR); OXIDATION; PATTERN RECOGNITION; WATER; WETTING;

FRINGING-FIELD INDUCED BARRIERS; OXIDE ETCHING; SELECTIVITY INVESTIGATION; WET ETCHING;

HAFNIUM COMPOUNDS;

EID: 17044398856     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

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