Selective wet etching of Hf-based layers

Proceedings - Electrochemical Society

Volumn 22, Issue , 2003, Pages 165-174

  Claes, M ^a   Paraschiv, V ^a   Boutkabout, H ^a   Witters, T ^a   De Gendt, S ^a   Rohr, E ^a   Coenegrachts, B ^b   Vertommen, J ^b   Richard, O ^a   Lindsay, R ^a   Boullart, W ^a   Heyns, M ^a  

^a IMEC   (Belgium)

^b LAM RESEARCH CORPORATION   (Belgium)

Author keywords

[No Author keywords available]

Indexed keywords

ANNEALING; CHEMICAL VAPOR DEPOSITION; DIELECTRIC MATERIALS; ETCHING; HAFNIUM COMPOUNDS; ION BOMBARDMENT; ION IMPLANTATION; PERMITTIVITY;

GATE ELECTRODE PATTERNING; SELECTIVE ETCH CHEMISTRY; WET ETCHING;

SEMICONDUCTOR MATERIALS;

EID: 3042732413     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (10)

1. T. Schram, S. Beckx, S. De Gendt, J. Vertommen and S. Lee, Solid State Technology, p. 61, June 2003.
2. B. Onsia, D. Hellin, M. Claes, S. De Gendt and M. Heyns, in Ultra Clean Processing of Silicon Surfaces V, M. Heyns, P. Mertens and M. Meuris, Editors, Solid State Phenomena 92, p.19, Scitec Publications Ltd, Switzerland (2003).
3. L. Liu, K.L. Pey and P. Foo, Proceedings 1996 IEEE Hong Kong Electron Devices Meeting, (1996).
4. J. Barnett, D. Riley, T. Messina, P. Lysaght and R.Carpio, in Ultra Clean Processing of Silicon Surfaces V, M. Heyns, P. Mertens and M. Meuris, Editors, Solid State Phenomena 92, p. 11, Scitec Publications Ltd, Switzerland (2003).
5. K. Saenger, H. Okorn-Schmidt and C. D'Emic, in Novel Materials and Processes for advanced CMOS, M. Gardner, S. De Gendt, J.P. Maria and S. Stemmer, Editors, MRS Symposium Proceedings 745, Philadelphia, 2003.
6. M. A. Quevedo-Lopez, M. El-Bouanani, R.M. Wallace and B.E. Gnade, J. Vac. Sci. Technol. A, 20 (6), 1891 (2002).
7. M. Meuris, P.W. Mertens, A. Opdebeeck, H.F. Schmidt, M. Depas, G. Vereecke, M.M. Heyns en A. Philipossian, Solid State Technology, 38 (7), 109 (1995).
8. http://www.srim.org
9. S. Verhaverbeke, I. Teerlinck, C. Vinckier, G. Stevens, R. Cartuyvels and M. Heyns, J. Electrochem. Soc., 141 (10), 2852 (1994).
10. B. Garrido, J. Montserrat and J.R. Morante, J. Electrochem. Soc., 143 (12), 4059 (1996).