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Volumn 72, Issue 1-4, 2004, Pages 24-28

Statistics of progressive breakdown in ultra-thin oxides

Author keywords

Breakdown statistics; CMOS; Dielectric breakdown; Oxide breakdown; Oxide reliability

Indexed keywords

COMPUTER SIMULATION; ELECTRIC BREAKDOWN; FAILURE ANALYSIS; LEAKAGE CURRENTS; MONTE CARLO METHODS; PROBABILITY; RELIABILITY; STATISTICAL METHODS; SUBSTRATES;

EID: 1642587670     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.mee.2003.12.010     Document Type: Conference Paper
Times cited : (31)

References (9)
  • 6
    • 0036931973 scopus 로고    scopus 로고
    • A new model of time evolution of gate leakage current after soft breakdown in ultra thin oxides
    • T. Hosoi, P. Re, Y. Kamakura, K. Taniguchi, A new model of time evolution of gate leakage current after soft breakdown in ultra thin oxides, 2002 IEDM Technical Digest, pp. 155-158.
    • 2002 IEDM Technical Digest , pp. 155-158
    • Hosoi, T.1    Re, P.2    Kamakura, Y.3    Taniguchi, K.4
  • 8
    • 0038309961 scopus 로고    scopus 로고
    • Phenomenological theory of correlated multiple soft-breakdown events in ultra-thin gate dielectrics
    • M.A. Alam, R.K. Smith, Phenomenological theory of correlated multiple soft-breakdown events in ultra-thin gate dielectrics, in: Proceedings of International Reliability Physics Symposium, 2003, pp. 406-411.
    • (2003) Proceedings of International Reliability Physics Symposium , pp. 406-411
    • Alam, M.A.1    Smith, R.K.2
  • 9
    • 0036926527 scopus 로고    scopus 로고
    • Statistics of Successive Breakdown Events for ultra thin gate oxides
    • J. Sune, E. Wu, Statistics of Successive Breakdown Events for ultra thin gate oxides, 2002 IEDM Technical digest pp. 147-150.
    • 2002 IEDM Technical Digest , pp. 147-150
    • Sune, J.1    Wu, E.2


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.