Growth and scaling of oxide conduction after breakdown

Annual Proceedings - Reliability Physics (Symposium)

Volumn , Issue , 2003, Pages 402-405

  Linder, Barry P ^a   Stathis, James H ^a   Frank, David J ^a   Lombardo, Salvatore ^b   Vayshenker, Alex ^c  

^a IBM T J WATSON RESEARCH CENTER   (United States)

^b CNR   (Italy)

^c IBM MICROELECTRONICS   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

DIELECTRIC MATERIALS; ELECTRIC POTENTIAL; GROWTH (MATERIALS); STRESS ANALYSIS;

GATE DIELECTRICS;

ELECTRIC BREAKDOWN;

EID: 0038649017     PISSN: 00999512     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (12)

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